Technical features
- Optional high-power light sources: 405nm LD, 355nm DPSSL（Dpssl355nm laser light source lifetime ＞ 20000h）
- Standard model supports for 12 inch substrate size, others can be customized
- Multi-dimensional lithography: Polarization Exposure, Interference Exposure, Supports 1024-level grayscale lithography
- High-precision motion platform
- High-precision environmental control system
- Auto-focus and real-time alignment
- Zonal positioning, multi-substrate, multi-task exposure
- Supports both automatic and manual alignment
- Supports file formats: GDSII, BMP, STL, etc.
Specifications
* Final interpretation rights belong to the company.
Example applications
