Technical features
In semiconductor manufacturing, masks (also known as Reticles) are used to transfer circuit design patterns to chips in bulk, carrying key information such as pattern design and process technology. Defects such as pattern errors and particle scratches on masks can affect the yield of semiconductor manufacturing, thereby affecting the performance and reliability of chips. The VPTek STORM 3000 series photomask inspection equipment is suitable for Mask shop and FAB factories to conduct factory inspections and regular monitoring of photomasks. Accurately detect graphic defects, soft defects, Haze, Glass surfaces, and Pellicle surfaces. Can meet the manufacturing process requirements of 180/130nm.
STORM 3000
STORM 3000 ? is the third generation IC Mask defect inspection product of VPtek. After years of continuous testing and improvement, STORM 3000 has been evaluated and recognized by top customers in the industry. STORM 3000 is based on advanced laser imaging technology and high-sensitivity software algorithms, and can have inspection modes such as DB, DD, SL, etc. It is suitable for Mask Shop and FAB's needs for mask production process, shipment, and regular inspection. For 180/130nm process technology, it has significant advantages such as high precision, high efficiency, and ease of use.
Application scenarios
Provide efficient Reticle inspection solutions for Reticle manufacturing and wafer manufacturing at 180/130nm and above nodes.
Key Features
- Ultra high resolution optical system based on UV laser
- Support simultaneous inspection of reflected and transmitted light
- Support DD, SL, and DB inspection modes
- Supports SMIF Pod, Nikon CASE, Canon CASE, Shipping Box and other film boxes
- Supports GDS, OASIS, MEBES file formats
- Supports Binary and PSM masks
- Support OPC calibration
- Support GPU distributed computing
IRIS-530
IRIS-530 is a dual surface particle inspection device for IC Mask launched by VPtek. The system adopts two sets of optical systems, top and bottom, and bright field and dark field illumination modes. It can simultaneously detect particles and dirt on both Pellicle and Glass surfaces, suitable for Mask shop shipment inspection and FAB factory daily monitoring.
Application scenarios
For Mask Shop shipment inspection FAB Reticle provides efficient and low-cost inspection solutions through regular monitoring.
Key Features
- Simultaneously detect particles on the glass surface and pellicle surface
- Compatible with RSP200 Nikon Case、 Opening of Crystal Box and Automatic Upper and Lower Plate
- Inspection method based on bright field and dark field
- Pellicle surface, glass surface, inner and outer inspection areas of membrane frame can be flexibly set
- Visual display of the relationship between defect location and graphic location
- Configure an air bath knife to remove surface particles
STORM 3000U
STORM 3000U is the new generation of VPteks IC Mask substrate defect inspection product. Based on the recognized STORM 3000 platform architecture, it optimizes optical imaging, transmission, and caching to improve usability and reduce equipment costs. Suitable for Mask Blank substrate production, shipment, and Mask shop incoming inspection needs, with a inspection accuracy of 200nm, it has significant advantages such as high efficiency, ease of use, and low cost.
Application scenarios
For IC Mask substrate manufacturing IC Mask Shop provides efficient and low-cost inspection solutions for incoming materials.
Key Features
- Laser based ultra-high resolution optical system
- Support SMIF Pod automatic loading and unloading
- Support particle, scratch, pinhole, and dirt inspection
- Support automatic review and defect classification
- Support polishing plates, chrome plates, and post adhesive testing
- Support automatic grading and caching of substrates
