Semiconductor Critical Dimension (CD) and Overlay (OVL) metrology tools are indispensable instruments in the chip manufacturing process. CD metrology tools are used to accurately measure the dimensions of micro-features on semiconductor wafers, ensuring they comply with design specifications. This is crucial for maintaining chip performance and yield. OVL metrology tools, on the other hand, are designed to evaluate the alignment accuracy between patterned layers in different manufacturing steps, ensuring that the patterns of each layer are precisely registered to avoid circuit functional failures. Through high-precision measurements, semiconductor CD and OVL metrology tools help engineers detect and resolve production issues in a timely manner, thus guaranteeing the quality and performance of the final products.
The VPTek Vortex series of metrology systems adopt UV optical imaging technology as well as reflective and transmissive illumination sources. Combined with high-precision edge detection algorithms, they achieve sub-pixel level measurement accuracy. Meanwhile, they are compatible with CD metrology for both photomasks and wafers.
Vortex 2000
Vortex 2000 is a semi-automatic optical key dimension and etching measurement device launched by VPtek for wafers. Based on a high-resolution optical imaging system, it supports two illumination modes: transmission and reflection, and is compatible with Mask/Wafer key dimension measurement. Paired with a high-performance motion table, it improves the positioning efficiency during the measurement process, reduces steady-state jitter, and meets the demanding requirements of measurement repeatability.
Application scenarios
Measurement of key dimensions and etching accuracy for 4, 6, 8, and 12 inch wafers and photomask masks.
Key Features
- Can simultaneously support CD measurement for up to 12 inch wafers and masks
- Supports UV, white light illumination, and optical systems
- Support transmission light (for Mask) and reflection light measurement
- Automatic measurement of optical system based on Recipe
- Support multiple line width measurement methods such as grayscale threshold, grayscale change rate, and line fitting
- Multi hold non-linear compensation function
- Support line width measurement under low contrast conditions
- Support rapid positioning measurement through GDS files
- Provide joystick and dedicated control keyboard for platform positioning and quick operation of common functions
